High-throughput synthesis of modified Fresnel zone plate arrays via ion beam lithography

• Kahraman Keskinbora,
• Umut Tunca Sanli,
• Margarita Baluktsian,
• Corinne Grévent,
• Markus Weigand and
• Gisela Schütz

Beilstein J. Nanotechnol. 2018, 9, 2049–2056, doi:10.3762/bjnano.9.194

• ) radiation; focused ion beam (FIB); Fresnel zone plate; ion beam lithography (IBL); nanopatterning; soft X-rays; Introduction Requirements for focusing elements that work at extreme ultraviolet (EUV) and soft X-ray (SXR) energies are very different from those of the more familiar ultraviolet, visible or

Electron-beam induced deposition and autocatalytic decomposition of Co(CO)₃NO

• Florian Vollnhals,
• Martin Drost,
• Fan Tu,
• Esther Carrasco,
• Andreas Späth,
• Rainer H. Fink,
• Hans-Peter Steinrück and
• Hubertus Marbach

Beilstein J. Nanotechnol. 2014, 5, 1175–1185, doi:10.3762/bjnano.5.129

• , Poland. STXM experiments were performed at the PolLux beamline at the Swiss Light Source (SLS), Paul Scherrer Institut, Villigen (CH) [28]. The standard STXM setup uses high brilliance synchrotron radiation light that is focused on the sample by a Fresnel zone plate. The sample is raster-scanned with